热处理提高聚甲基丙烯酸甲酯电子抗蚀剂的分辨率
Enhanced Resolution of Poly-(Methyl Methacrylate) Electron Resist by Thermal Processing
摘要：
电子束光刻胶的颗粒状纳米结构限制了电子束光刻的最终分辨率。我们报道了一种获得均匀和均一的聚甲基丙烯酸甲酯电子抗蚀剂非晶薄膜的热工艺。除了精确优化的显影工艺条件外，该热工艺还包括短时间高温背衬工艺。利用这种新工艺，我们在直径小于5nm的金属薄膜上图案化了孔阵列。此外，抗蚀剂的线边缘粗糙度和表面粗糙度分别降低到1nm和100 μ m。
英文摘要：
Granular nanostructure of electron beam resist had limited the ultimate resolution of electron beam lithography. We report a thermal process to achieve a uniform and homogeneous amorphous thin film of poly methyl methacrylate electron resist. This thermal process consists of a short time-high temperature backing process in addition to precisely optimized development process conditions. Using this novel process, we patterned arrays of holes in a metal film with diameter smaller than 5nm. In addition, line edge roughness and surface roughness of the resist reduced to 1nm and 100pm respectively.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
