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arXiv 1202.3237cond-mat.mes-hallcond-mat.mtrl-scicond-mat.otherquant-ph
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同位素纯$^{28}$ Si量子阱中的少电子双量子点

Few electron double quantum dot in an isotopically purified $^{28}$Si quantum well

Andreas Wild, Johannes Kierig, Jürgen Sailer, Joel Ager, Eugene Haller, Gerhard Abstreiter, Stefan Ludwig, Dominique Bougeard

摘要:

我们提出了一种在同位素纯化的$^{28}$ Si量子阱(QW)中定义的少电子双量子点(QD)器件。在量子阱中观察到$5.5 \cdot 10^4 cm^2(Vs)^{-1}$的电子迁移率,这是有史以来报道的$^{28}$ Si中的2D电子系统的最高迁移率。在$^{28}$ Si QW中的$^{29}$ Si核的残余浓度低于$10^{3} ppm$,在理论上不再预期超精细相互作用主要限制$T_{2}$自旋退相时间的边缘处。我们还展示了一个完整的抑制迟滞栅极行为和电荷噪声使用负偏置的全球顶栅。

英文摘要:

We present a few electron double quantum dot (QD) device defined in an isotopically purified $^{28}$Si quantum well (QW). An electron mobility of $5.5 \cdot 10^4 cm^2(Vs)^{-1}$ is observed in the QW which is the highest mobility ever reported for a 2D electron system in $^{28}$Si. The residual concentration of $^{29}$Si nuclei in the $^{28}$Si QW is lower than $10^{3} ppm$, at the verge where the hyperfine interaction is theoretically no longer expected to dominantly limit the $T_{2}$ spin dephasing time. We also demonstrate a complete suppression of hysteretic gate behavior and charge noise using a negatively biased global top gate.

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