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arXiv 1202.0574cond-mat.mtrl-sciphysics.optics
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高铒浓度下Si-Er-O和Si-Ge-Er-O薄膜中Er3 +的室温光致发光

Room-Temperature Photoluminescence from Er3+ in Si-Er-O and Si-Ge-Er-O Thin Films at High Erbium Concentrations

Sufian Abedrabbo, Anthony Fiory

摘要:

先前的研究已经表明,在室温下,来自硅中的Er 3+杂质的光致发光受到非辐射弛豫和固溶度的严重限制;并且在高铒浓度下,来自氧化物基基质中的Er 3+的室温发射变得减少。这项工作提出了研究薄膜(0.2微米厚)真空共蒸发从元素源(Er,Si和Si/Ge),然后真空退火(600 ℃);这种类型的材料,这是生产高Er 3+浓度,被证明是能够产生强的室温光致发光。Si-Er-O和Si-Ge-Er-O合金膜,含(20 +/- 2)at. %的Er和掺入(16 +/-2)at. % O(通过真空清除反应引入),在1.51和1.54微米(约0.04微米的总光谱宽度)处表现出具有主要成分的发射带。讨论了Er-O络合物的形成和Er 3+离子间热展宽和局域场斯塔克分裂4 I13/2到4 I15/2跃迁的局部随机性对能量转移的影响。讨论了与这种生产光学活性硅基材料的方法相关的可扩展性和低成本的优点。

英文摘要:

Prior studies have shown that photoluminescence from Er3+ impurities in silicon is severely limited at room temperature by non-radiative relaxation and solid solubility; and room temperature emission from Er3+ in oxide-based hosts becomes diminished at high erbium concentrations. This work presents studies of thin films (0.2 micron thick) prepared by vacuum co-evaporation from elemental sources (Er, Si and Si/Ge) followed by vacuum annealing (600 degrees C); materials of this type, which are produced with high Er3+ concentrations, are shown to be capable of yielding strong room-temperature photoluminescence. Alloy films of Si-Er-O and Si-Ge-Er-O, containing (20 +/- 2) at. % Er and incorporating (16 +/- 2) at. % O (introduced via vacuum scavenging reactions), exhibit emission bands with dominant components at 1.51 and 1.54 micron (~0.04-micron overall spectral widths). Results are discussed in terms of Er-O complex formation and effects of local randomness on cooperative inter-Er3+ energy transfer among thermal-broadened and local-field Stark-split 4I13/2 to 4I15/2 transitions. Advantages of scalability and low-cost associated with this method of producing optically active silicon-based materials are discussed.

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