arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1111.6737cond-mat.str-elcond-mat.mtrl-scicond-mat.otherquant-ph
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用Wannier函数研究DFT中的范德华相互作用:用新方法改进$C_6$和$C_3$系数

Van der Waals Interactions in DFT using Wannier Functions: improved $C_6$ and $C_3$ coefficients by a new approach

A. Ambrosetti, P. L. Silvestrelli

摘要:

本文提出了一种新的实现方法,利用极大定域Wannier函数将范德华相互作用引入密度泛函理论。相对于以前的DFT/vdW-WF方法,本DFT/vdW-WF 2的方法,这是基于更简单的伦敦表达式,并考虑到局部Wannier函数的片段内重叠,导致相当大的改善,在评估的$C_6$范德华系数,如所示的应用程序到一组选定的二聚体。对石墨表面上Ar和Cu(111)金属表面上Ne的初步结果表明,表征分子-表面范德华相互作用的$C_3$系数也能用新方案得到较好的估计。

英文摘要:

A new implementation is proposed for including van der Waals interactions in Density Functional Theory using the Maximally-Localized Wannier functions. With respect to the previous DFT/vdW-WF method, the present DFT/vdW-WF2 approach, which is based on the simpler London expression and takes into account the intrafragment overlap of the localized Wannier functions, leads to a considerable improvement in the evaluation of the $C_6$ van der Waals coefficients, as shown by the application to a set of selected dimers. Preliminary results on Ar on graphite and Ne on the Cu(111) metal surface suggest that also the $C_3$ coefficients, characterizing molecule-surfaces van der Waals interactions are better estimated with the new scheme.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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