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arXiv 1109.4435physics.plasm-ph
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工艺等离子体中离子能量分布函数的建模与模拟

Modeling and simulation of ion energy distribution functions in technological plasmas

Thomas Mussenbrock

摘要:

蚀刻和沉积等高度先进的表面处理主要是通过技术等离子体的非凡特性实现的。影响这些过程的主要因素是撞击衬底表面的各种物质(特别是离子)的通量和能量。这些特征可以用离子能量分布函数(IEDF)理论上描述。本文从简化模型到自洽等离子体模拟,总结了IEDF建模和模拟的基本概念。最后,控制IEDF的概念进行了讨论。

英文摘要:

The highly advanced treatment of surfaces as etching and deposition is mainly enabled by the extraordinary properties of technological plasmas. The primary factors that influence these processes are the flux and the energy of various species, particularly ions, that impinge the substrate surface. These features can be theoretically described using the ion energy distribution function (IEDF). The article is intended to summarize the fundamental concepts of modeling and simulation of IEDFs from simplified models to self-consistent plasma simulations. Finally, concepts for controlling the IEDF are discussed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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