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arXiv 1105.3203cond-mat.mes-hallcond-mat.mtrl-sci
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石墨烯中的库仑阻力

Coulomb drag in graphene

E. H. Hwang, S. Das Sarma

摘要:

我们从理论上计算了两个石墨烯单层的库仑拖曳电阻率空间上分开的距离“$d$“。结果表明,在高密度($k_F d \gg 1$)和低密度($k_F d \ll 1$)极限下,由层间电子-电子相互作用引起的摩擦阻力分别渐近为$T^2/n^3$和$T^2 \ln(n)/n$.

英文摘要:

We calculate theoretically the Coulomb drag resistivity for two graphene monolayers spatially separated by a distance "$d$". We show that the frictional drag induced by inter-layer electron-electron interaction goes asymptotically as $T^2/n^3$ and $T^2 \ln(n)/n$ in the high-density ($k_F d \gg 1$) and low-density ($k_F d \ll 1$) limits, respectively.

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