Nanoscale measurement of the Power Spectral Density of surface roughness: a difficult experimental challenge and how to solve it
Juan Francisco González Martínez, Inés Nieto Carvajal, José Abad, Jaime Colchero Paetz
备注：
22 pages, 6 figures. This work was supported by the Spanish Ministry of Science and Technology through the projects Consolider XX and MAT2010-XX as well as by the "Comunidad Autónoma de la Región de Murcia" through the project "Células solares orgánicas: de la estructura molecular y nanométrica a dispositivos operativos macroscópicos"
In the present work we show that the correct determination of surface morphology using Scanning Force Microscopy (SFM) imaging and Power Spectral Density (PSD) analysis of the surface roughness is an extremely demanding task that is easily affected by experimental parameters such as scan speed and feedback parameters. We present examples were the measured topography data is significantly influenced by the feedback response of the SFM system and the PSD curves calculated from this experimental data do not correspond to that of the true topography. Instead, either features are "lost" due to low pass filtering or features are "created" due to oscillation of the feedback loop. In order to overcome these serious problems we show that the interaction signal (error signal) can be used not only to quantitatively control but also to significantly improve the quality of the topography raw data used for the PSD analysis. In particular, the calibrated error signal image can be used in combination with the topography image in order to obtain a correct representation of surface morphology ("true" topographic image). From this "true" topographic image a faithful determination of the PSD of surface morphology is possible. The corresponding PSD curve is not affected by the fine-tuning of feedback parameters, and allows for much faster image acquisition speeds without loss information in the PSD curve.
Roughness-controlled Tribocharging Governs Friction in Dry Glass Contacts
University of Amsterdam（阿姆斯特丹大学）；Van’t Hoff Institute for Molecular Sciences（范特霍夫分子科学研究所）；Advanced Research Center for Nanolithography (ARCNL)（先进纳米光刻研究中心）
Time-domain extreme ultraviolet diffuse scattering spectroscopy of nanoscale surface phonons
Elettra Sincrotrone Trieste（的里雅斯特同步辐射中心）；Massachusetts Institute of Technology（麻省理工学院）；Ca’ Foscari University of Venice（威尼斯卡福斯卡里大学）；Max Born Institute（马克斯·玻恩研究所）；University of Bern（伯尔尼大学）；Università degli Studi di Trieste（的里雅斯特大学）；University of Erlangen-Nürnberg（埃尔朗根-纽伦堡大学）；University of Siegen（锡根大学）；Synchrotron SOLEIL（SOLEIL同步辐射中心）；Lawrence Berkeley National Lab（劳伦斯伯克利国家实验室）；Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory（斯坦福材料与能源科学研究所，SLAC国家加速器实验室）；Stanford PULSE Institute, SLAC National Accelerator Laboratory（斯坦福PULSE研究所，SLAC国家加速器实验室）
Accelerated Discovery of Topological Conductors for Nanoscale Interconnects
NORDITA, KTH Royal Institute of Technology and Stockholm University（北欧理论粒子物理研究所，皇家理工学院和斯德哥尔摩大学）；University of Connecticut（康涅狄格大学）；Northwestern University（西北大学）；IBM Thomas J. Watson Research Center（IBM托马斯·J·沃森研究中心）；National Yang Ming Chiao Tung University（国立阳明交通大学）；Academia Sinica（中央研究院）
Control of Cu morphology on TaN barrier and combined Ru-TaN barrier/liner substrates for nanoscale interconnects from atomistic kinetic Monte Carlo simulations
本研究利用基于 DFT 能垒的原子尺度 kMC 模拟，考察不同 Ru 掺入量、温度和分压下 TaN 及 Ru-TaN 复合阻挡层/衬垫层上的 Cu 沉积形貌，以优化纳米互连体积。
