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arXiv 1007.4432physics.ins-det
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高电场下体硅中载流子迁移率和漂移速度饱和度的测量<111><100>

Measurements of charge carrier mobilities and drift velocity saturation in bulk silicon of <111> and <100> crystal orientation at high electric fields

Julian Becker, Eckhart Fretwurst, Robert Klanner

摘要:

硅中电子和空穴的迁移率取决于许多参数。其中两个是电场和温度。先前已经观察到,欧姆传输和饱和速度之间的过渡区中的迁移率是晶格取向的函数。本文提出了一组新的参数的迁移率作为温度和电场的函数<111>和<100>晶体取向。这些参数是在温度范围为-30 ° C至50°C、电场为2 × 10^3 V/cm至2 × 10^4 V/cm的条件下,通过测量平面p^+nn^+二极管中漂移电荷载流子的飞行时间得出的。

英文摘要:

The mobility of electrons and holes in silicon depends on many parameters. Two of them are the electric field and the temperature. It has been observed previously that the mobility in the transition region between ohmic transport and saturation velocities is a function of the orientation of the crystal lattice. This paper presents a new set of parameters for the mobility as function of temperature and electric field for <111> and <100> crystal orientation. These parameters are derived from time of flight measurements of drifting charge carriers in planar p^+nn^+ diodes in the temperature range between -30°C and 50°C and electric fields of 2x10^3 V/cm to 2x10^4 V/cm.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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