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arXiv 1004.1695cond-mat.mtrl-scicond-mat.mes-hall
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非晶相变纳米线材料的极低漂移

Extremely Low Drift in Amorphous Phase Change Nanowire Materials

Mukut Mitra, Yeonwoong Jung, Daniel S. Gianola, Ritesh Agarwal

摘要:

相变存储器(PCM)器件中的电阻和阈值电压的时间依赖性漂移是令人关注的,因为它导致数据丢失。非晶硫族化物的电漂移被认为是由于电子或应力弛豫机制。在这里,我们表明,漂移在非晶化的Ge2Sb2Te5纳米线与暴露的表面是非常低的薄膜器件相比。然而,在应力下的纳米线埋在介电薄膜的漂移是可比的薄膜。我们的研究结果表明,PCM中的漂移是由于应力松弛,将有助于理解和控制PCM器件中的漂移。

英文摘要:

Time-dependent drift of resistance and threshold voltage in phase change memory (PCM) devices is of concern as it leads to data loss. Electrical drift in amorphous chalcogenides has been argued to be either due to electronic or stress relaxation mechanisms. Here we show that drift in amorphized Ge2Sb2Te5 nanowires with exposed surfaces is extremely low in comparison to thin-film devices. However, drift in stressed nanowires embedded under dielectric films is comparable to thin-films. Our results shows that drift in PCM is due to stress relaxation and will help in understanding and controlling drift in PCM devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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