Conductance asymmetry of a slot gate Si-MOSFET in a strong parallel magnetic field

Resistance asymmetry of a two-dimensional electron gas caused by an effective spin injection

We have performed conductivity measurements on a Si-MOSFET sample with a slot in the upper gate, allowing for different electron densities n_1 and n_2 across the slot. Dynamic longitudinal resistance was measured by a standard lock-in technique, while maintaining a large DC current through the source-drain channel. We find that in a parallel magnetic field, the resistance of the sample, R(I_DC), is asymmetric with respect to the direction of the DC current. The asymmetry becomes stronger with an increase of either the magnetic field or the difference between n_1 and n_2. These observations are…

Contactless measurement of electrical conductance of a thin film of amorphous germanium

We present a contactless method for measuring charge in a thin film of amorphous germanium (a-Ge) with a nanoscale silicon MOSFET charge sensor. This method enables the measurement of conductance of the a-Ge film even in the presence of blocking contacts. At high bias voltage, the resistance of the contacts becomes negligible and a direct measurement of current gives a conductance that agrees with that from the measurement of charge. This charge-sensing technique is used to measure the temperature- and field-dependence of the conductance, and they both agree with a model of Mott variable-range…

Detection of a single-charge defect in a metal-oxide-semiconductor structure using vertically coupled Al and Si single-electron transistors

An Al-AlO_x-Al single-electron transistor (SET) acting as the gate of a narrow (~ 100 nm) metal-oxide-semiconductor field-effect transistor (MOSFET) can induce a vertically aligned Si SET at the Si/SiO_2 interface near the MOSFET channel conductance threshold. By using such a vertically coupled Al and Si SET system, we have detected a single-charge defect which is tunnel-coupled to the Si SET. By solving a simple electrostatic model, the fractions of each coupling capacitance associated with the defect are extracted. The results reveal that the defect is not a large puddle or metal island, but…

量子霍尔涨落和量子霍尔效应中带电的证据

Quantum Hall fluctuations and evidence for charging in the quantum Hall effect

我们发现，介观电导波动的量子霍尔制度在硅MOSFET显示简单和惊人的模式。波动落入不同的组，其沿着平行于栅极电压-磁场平面中的整数填充因子的轨迹的线移动。此外，量子霍尔跃迁的涨落与低密度下零磁场中的涨落之间也存在着联系。这些现象最自然地归因于充电效应。我们认为，它们是第一个明确的表现形式的相互作用，在直流运输的整数量子霍尔效应。

Charge dynamics of a single donor coupled to a few electrons quantum dot in silicon

We study the charge transfer dynamics between a silicon quantum dot and an individual phosphorous donor using the conduction through the quantum dot as a probe for the donor ionization state. We use a silicon n-MOSFET (metal oxide field effect transistor) biased near threshold in the SET regime with two side gates to control both the device conductance and the donor charge. Temperature and magnetic field independent tunneling time is measured. We measure the statistics of the transfer of electrons observed when the ground state D0 of the donor is aligned with the SET states.

Single-hole tunneling through a two-dimensional hole gas in intrinsic silicon

In this letter we report single-hole tunneling through a quantum dot in a two-dimensional hole gas, situated in a narrow-channel field-effect transistor in intrinsic silicon. Two layers of aluminum gate electrodes are defined on Si/SiO$_2$ using electron-beam lithography. Fabrication and subsequent electrical characterization of different devices yield reproducible results, such as typical MOSFET turn-on and pinch-off characteristics. Additionally, linear transport measurements at 4 K result in regularly spaced Coulomb oscillations, corresponding to single-hole tunneling through individual Cou…