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arXiv 0908.0841cond-mat.mtrl-scicond-mat.mes-hall
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Si(001)表面Ge量子点阵列的缺陷

Defects of Ge quantum dot arrays on the Si(001) surface

V. A. Yuryev, L. V. Arapkina

摘要:

Ge量子点阵列的缺陷会影响Ge/Si异质结构的电物理、光电或光学性质以及在其基础上制备的器件的功能。用超高真空扫描隧道显微镜和分子束外延室研究了Si(001)表面中温生长Ge量子点阵列的缺陷。对缺陷进行了初步分类。对缺陷的形态特征进行了研究。测定了不同类型缺陷的表面密度。

英文摘要:

Defects of Ge quantum dot arrays may affect the electrophysical, photoelectrical or optical properties of Ge/Si heterostructures as well as the functionality of devices produced on their basis. The defects of Ge quantum dot arrays formed at moderate temperatures on the Si(001) surface have been investigated by the ultra high vacuum scanning tunnelling microscope integrated with the molecular beam epitaxy chamber. A preliminary classification of the defects has been carried out. Morphological peculiarities of the defects have been studied. The surface densities of defects of different types have been determined.

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