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arXiv 0905.0790cond-mat.mtrl-sci
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具有巨自旋分裂的硅表面

Silicon surface with giant spin-splitting

I. Gierz, T. Suzuki, E. Frantzeskakis, S. Pons, S. Ostanin, A. Ernst, J. Henk, M. Grioni, K. Kern, C. R. Ast

摘要:

我们在Si(111)晶片上用Bi三聚体吸附层在半导体衬底上诱导了一个巨大的Rashba型自旋分裂。面内反转对称性被破坏,使得面内电势梯度引起具有约140 meV的Rashba能量的巨大自旋分裂,这比先前报道的任何半导体异质结构的自旋分裂大一个数量级以上。电子态的分离大于它们的寿命展宽,这已经用角分辨光电子能谱直接观察到。实验结果得到了相对论第一性原理计算的证实。我们设想的基本现象,以及为半导体为基础的技术的重要影响。

英文摘要:

We demonstrate the induction of a giant Rashba-type spin-splitting on a semiconducting substrate by means of a Bi trimer adlayer on a Si(111) wafer. The in-plane inversion symmetry is broken so that the in-plane potential gradient induces a giant spin-splitting with a Rashba energy of about 140 meV, which is more than an order of magnitude larger than what has previously been reported for any semiconductor heterostructure. The separation of the electronic states is larger than their lifetime broadening, which has been directly observed with angular resolved photoemission spectroscopy. The experimental results are confirmed by relativistic first-principles calculations. We envision important implications for basic phenomena as well as for the semiconductor based technology.

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