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arXiv 0804.0764physics.optics
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UV- laser辐照下六方氮化硼的光致发光:表面氧化的影响

Photoluminescence of hexagonal boron nitride: effect of surface oxidation under UV-laser irradiation

Luc Museur, Demetrios Anglos, Jean-Pierre Petitet, Jean Pierre Michel, Andrei V. Kanaev

摘要:

我们报告的紫外激光诱导荧光的六方氮化硼(h-BN)以下纳秒激光照射的表面在真空下,在不同的环境中的氮气和环境空气。所观察到的荧光带被暂时归因于杂质和单(VN),或多(m-VN与m = 2或3)氮空位。在300 nm和350 nm之间的结构荧光带被指定为杂质带跃迁,其复杂的线形归因于声子副本。在真空下观察到一个位于340 nm的附加带,归属于表面上的VN空位,并被吸附的分子氧淬灭。在真空下UV照射h-BN导致在~400 nm处的宽的不对称荧光,其被分配给m-VN空位;进一步照射使更多的B-N键断裂,使表面富集元素硼。而在大气中辐照时,样品中没有硼沉积。这种效应是由氧愈合的辐射引起的表面缺陷。氧化物层的形成防止B-N解离并保持批量样品的化学计量。

英文摘要:

We report on the UV laser induced fluorescence of hexagonal boron nitride (h-BN) following nanosecond laser irradiation of the surface under vacuum and in different environments of nitrogen gas and ambient air. The observed fluorescence bands are tentatively ascribed to impurity and mono (VN), or multiple (m-VN with m = 2 or 3) nitrogen vacancies. A structured fluorescence band between 300 nm and 350 nm is assigned to impurity-band transition and its complex lineshape is attributed to phonon replicas. An additional band at 340 nm, assigned to VN vacancies on surface, is observed under vacuum and quenched by adsorbed molecular oxygen. UV-irradiation of h-BN under vacuum results in a broad asymmetric fluorescence at ~400 nm assigned to m-VN vacancies; further irradiation breaks more B-N bonds enriching the surface with elemental boron. However, no boron deposit appears under irradiation of samples in ambient atmosphere. This effect is explained by oxygen healing of radiation-induced surface defects. Formation of the oxide layer prevents B-N dissociation and preserves the bulk sample stoichiometry.

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