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arXiv 0802.2425cond-mat.str-elcond-mat.mes-hall
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半导体表面态的拓扑学

Topological Aspects of Surface States in Semiconductors

Yoshihiro Kuge, Isao Maruyama, Yasuhiro Hatsugai

摘要:

本文用绝热变形方法研究了半导体表面态的拓扑性质,该方法将一个实际系统和一个解耦的共价键模型联系起来。两个拓扑不变量的重点。一个是量子化的Berry相位,另一个是边缘态的数量。作为另一种拓扑不变量的缠绕数也被考虑。利用拓扑不变量对Si和Ge在(111)、(110)和(100)面的表面态进行了分类。本文还讨论了GaAs异质半导体的表面态。

英文摘要:

Topological aspects of surface states in semiconductors are studied by an adiabatic deformation which connects a realistic system and a decoupled covalent-bond model. Two topological invariants are focused. One is a quantized Berry phase, and the other is a number of the edge states. A winding number as another topological invariant is also considered. The surface states of Si and Ge at (111), (110), and (100) surfaces are classified by the topological invariants. Surface states of the GaAs as heterosemiconductors are also discussed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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