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arXiv 0711.4199hep-ex
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在高光度陶查姆工厂进行的BES-III实验

The BES-III experiment at the high luminosity Tau-Charm factory

Yi-Fang Wang

摘要:

BES-Ⅱ和其它实验的有趣结果实际上提出了许多新的问题,这些问题将由它的升级计划BEPCII和BES-Ⅲ来回答。介绍了北京正负电子对撞机Ⅱ和北京谱仪Ⅲ的设计和现状。

英文摘要:

Interesting results from BES-II and other experiments raised actually many new questions which shall be answered by its upgrade program, BEPCII and BES-III. The design and current status of BEPCII and BES-III are reported.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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