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arXiv 0711.2263quant-ph
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商用氮化硅薄膜的高质量机械和光学性能

High quality mechanical and optical properties of commercial silicon nitride membranes

B. M. Zwickl, W. E. Shanks, A. M. Jayich, C. Yang, A. C. Bleszynski Jayich, J. D. Thompson, J. G. E. Harris

摘要:

我们已经测量了商业氮化硅膜的光学和机械损耗。我们发现,50 nm厚、1 mm^2的薄膜在293 K时的机械Q > 10^6,在300 mK时的Q > 10^7,远高于在具有可比尺寸的器件中观察到的结果。在293 K下的近红外光学损耗小于2 E-4。这些特性的组合使得这些膜在研究光机械系统中的量子效应方面具有吸引力。

英文摘要:

We have measured the optical and mechanical loss of commercial silicon nitride membranes. We find that 50 nm-thick, 1 mm^2 membranes have mechanical Q > 10^6 at 293 K, and Q > 10^7 at 300 mK, well above what has been observed in devices with comparable dimensions. The near-IR optical loss at 293 K is less than 2E-4. This combination of properties make these membranes attractive candidates for studying quantum effects in optomechanical systems.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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