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arXiv 0706.2138cond-mat.mtrl-sci
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(Ga,Mn)As的氢钝化磁性图形化

Magnetic patterning of (Ga,Mn)As by hydrogen passivation

Laura Thevenard, Audrey Miard, Laurent Vila, Giancarlo Faini, Aristide Lemaître, Nicolas Vernier, Jacques Ferré, Stéphane Fusil

摘要:

我们提出了一种新颖的方法来磁性图案化(Ga,Mn)As薄层。它依赖于局部氢钝化,以显着降低空穴密度,从而局部抑制载体介导的铁磁相。样品表面因此保持连续,并且最小结构尺寸为约200 nm。在垂直磁化层上通过氢钝化制造的微米尺寸的铁磁点中,与通过通常的干法蚀刻技术制造的点相比,切换场可以保持更接近连续膜的介电常数。

英文摘要:

We present an original method to magnetically pattern thin layers of (Ga,Mn)As. It relies on local hydrogen passivation to significantly lower the hole density, and thereby locally suppress the carrier-mediated ferromagnetic phase. The sample surface is thus maintained continuous, and the minimal structure size is of about 200 nm. In micron-sized ferromagnetic dots fabricated by hydrogen passivation on perpendicularly magnetized layers, the switching fields can be maintained closer to the continuous film coercivity, compared to dots made by usual dry etch techniques.

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