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arXiv 0912.0754cond-mat.mes-hallcond-mat.mtrl-sci
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氢封端Ge(001)原子尺度图形化的扫描隧道显微镜研究

Atomic-scale patterning of hydrogen terminated Ge(001) by scanning tunneling microscopy

G. Scappucci, G. Capellini, W. C. T. Lee, M. Y. Simmons

摘要:

在本文中,我们展示了原子级光刻的氢终止锗(001。光刻图案是通过在超高真空中使用扫描隧道显微镜针尖从吸附在干净的原子级平坦Ge(001)表面上的H抗蚀剂层选择性地解吸氢原子而获得的。研究了针尖-样品偏压对光刻工艺的影响。通过改变尖端到样本的偏差,可以实现特征尺寸从200纳米到1.8纳米的光刻图案。这些结果开辟了一个扫描探针光刻方法的可能性,以制造未来的原子级器件的锗。

英文摘要:

In this paper we demonstrate atomic-scale lithography on hydrogen terminated Ge(001. The lithographic patterns were obtained by selectively desorbing hydrogen atoms from a H resist layer adsorbed on a clean, atomically flat Ge(001) surface with a scanning tunneling microscope tip operating in ultra-high vacuum. The influence of the tip-to-sample bias on the lithographic process have been investigated. Lithographic patterns with feature-sizes from 200 nm to 1.8 nm have been achieved by varying the tip-to-sample bias. These results open up the possibility of a scanning-probe lithography approach to the fabrication of future atomic-scale devices in germanium.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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