arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv quant-ph/0503038quant-ph
收藏

范德华原子-壁相互作用对原子和材料性质的依赖性

Dependences of the van der Waals atom-wall interaction on atomic and material properties

A. O. Caride, G. L. Klimchitskaya, V. M. Mostepanenko, S. I. Zanette

摘要:

在3 ~ 150 nm的分离区,对原子与腔壁间的范德华相互作用进行了1%精度的计算。亚稳态的情况下,他${}^{\ast}$和Na原子附近的金属,半导体或电介质壁被认为是。不同的近似壁材料和原子的动态极化率的描述进行了仔细比较。Casimir-Polder相互作用的平滑过渡得到验证。结果表明,要在最短间距下得到原子-壁面范德华相互作用的精确结果,误差小于1%,必须使用完整的壁面材料复折射率和原子精确的动态极化率的光学列表数据。所得结果可用于解释最近关于超冷原子在不同性质表面上或表面附近的量子反射和玻色-爱因斯坦凝聚的实验。

英文摘要:

The 1%-accurate calculations of the van der Waals interaction between an atom and a cavity wall are performed in the separation region from 3 nm to 150 nm. The cases of metastable He${}^{\ast}$ and Na atoms near the metal, semiconductor or dielectric walls are considered. Different approximations to the description of wall material and atomic dynamic polarizability are carefully compared. The smooth transition to the Casimir-Polder interaction is verified. It is shown that to obtain accurate results for the atom-wall van der Waals interaction at shortest separations with an error less than 1% one should use the complete optical tabulated data for the complex refraction index of the wall material and the accurate dynamic polarizability of an atom. The obtained results may be useful for the theoretical interpretation of recent experiments on quantum reflection and Bose-Einstein condensation of ultracold atoms on or near surfaces of different nature.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑