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arXiv math/0602179math.NAcs.NAmath-phmath.MP

麦克斯韦方程的域分解方法:周期性结构的散射

Domain Decomposition Method for Maxwell's Equations: Scattering off Periodic Structures

Achim Schädle, Lin Zschiedrich, Sven Burger, Roland Klose, Frank Schmidt

AI总结:

针对周期性结构中的电磁场计算,提出一种基于Schwarz方法并采用透明边界条件(通过PML近似)的域分解方法,并开发自适应策略处理Wood异常,应用于EUV光刻掩模,通过解析处理多层堆叠大幅降低计算成本。

摘要:

我们提出了一种用于计算周期性结构内电磁场的域分解方法。我们使用Schwarz方法,在域界面处采用透明边界条件。透明边界条件通过完美匹配层方法(PML)近似。为了应对周期性结构中出现的Wood异常,我们开发了一种自适应策略来确定最优PML参数。我们重点研究了典型EUV光刻线掩模的应用。EUV掩模多层堆叠内的光传播被解析处理。这导致计算成本的大幅降低,并允许在标准个人计算机上模拟下一代光刻掩模。

英文摘要:

We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains. Transparent boundary conditions are approximated by the perfectly matched layer method (PML). To cope with Wood anomalies appearing in periodic structures an adaptive strategy to determine optimal PML parameters is developed. We focus on the application to typical EUV lithography line masks. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a drastic reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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