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arXiv 2606.22366physics.optics
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基于结构光的无对准纳米光学计量

Alignment-Free Nanometric Optical Metrology Enabled by Structured Light

Nanyang Technological University(南洋理工大学);Chengdu University of Technology(成都理工大学);University of Tsukuba(筑波大学);National Applied Research Laboratories, Taiwan Instrument Research Institute(国家应用研究中心台湾仪器研究所);University of Southampton(南安普顿大学)

Yu Wang, Benquan Wang, Eng Aik Chan, Songze Li, Zhenyu Guo, Xi Xie, Masako Kishida, Che-Chin Chen, Yijie Shen, Jun-Yu Ou

AI总结:

提出利用拉盖尔-高斯或厄米-高斯结构光照明,结合AI分析方法,实现单次、无标记、无对准的亚波长结构一维位置测量,精度达λ/110(7.2 nm)。

摘要:

半导体工业的进步得益于日益紧凑且具有复杂刻蚀几何结构的器件的发展,其表征本质上需要超精密、无标记和实时的计量技术。然而,对亚波长结构进行非破坏性、无对准的光学计量仍是一个重大挑战。本文展示了一种新颖的单次、无标记、无对准的光学计量方法,用于确定亚波长纳米结构的一维位置,实现了λ/110(7.2 nm)的精度。高精度得益于利用拉盖尔-高斯(LG)或厄米-高斯(HG)光束的结构化照明,并且AI分析方法能够在这种结构光与亚波长物体相互作用时提取信息。与超振荡显微镜中依赖相位奇点不同,我们的方法利用了HG和LG光束与纳米结构相互作用时产生的空间分布相位跳变,为光学计量中的挑战提供了对准鲁棒的解决方案。这种无对准、非破坏性、高精度的计量技术可实现实时机器视觉、半导体检测和先进制造。

英文摘要:

Advances in the semiconductor industry are driven by the development of increasingly compact devices featuring intricate etched geometries, the characterization of which essentially requires ultraprecise, label-free, and real-time metrology. However, non-destructive and alignment-free optical metrology of sub-wavelength structures with nanometric resolution remains a major challenge. Here, we demonstrate a novel single-shot, label-free, and alignment-free optical metrology approach for determining the 1D position of sub-wavelength nanostructures, achieving lambda/110 (7.2 nm) precision. The high precision benefits from utilizing structured illuminations of Laguerre-Gaussian (LG) or Hermite-Gaussian (HG) beams, and the AI analyzing method can retrieve the information when such structured light interacts with sub-wavelength objects. Instead of relying on phase singularities in superoscillatory microscopy, our approach leverages spatially distributed phase jumps in HG and LG beams interacting with the nanostructures, providing an alignment-robust solution to the challenges in optical metrology. Such an alignment-free, non-destructive, and high-precision metrology technique enables real-time machine vision, semiconductor inspection, and advanced manufacturing.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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