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arXiv 2511.08758physics.app-phcond-mat.mtrl-sci
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通过微波等离子体CVD在β-氧化镓上集成高纯度钻石以增强热管理

High-Purity Diamond Integration on $β$-Ga$_2$O$_3$ via Microwave Plasma CVD for Enhanced Thermal Management

University of Massachusetts Lowell(马萨诸塞大学洛厄尔分校)

Saleh Ahmed Khan, Stephen Margiotta, Ahmed Ibreljic, Anhar Bhuiyan

AI总结:

本文通过微波等离子体CVD在β-氧化镓上集成多晶钻石,研究生长条件对薄膜形貌、晶粒演化、相纯度和光学特性的影响,展示了高纯度钻石薄膜的制备方法及热管理提升的潜力。

摘要:

在高功率电子设备中,将钻石与β-氧化镓集成提供了一条增强热管理的有前途的途径,因为β-氧化镓固有的低热导率可能导致局部自加热和结温升高。本文展示了一种可扩展且低损伤的方法,通过微波等离子体化学气相沉积(MPCVD)在(010)β-氧化镓基板上集成多晶钻石薄膜,采用介电中间层和聚合物辅助静电纳米钻石种子来系统评估生长条件对薄膜形貌、晶粒演化、相纯度和光学特性的影响。在800°C的生长温度下,随着沉积时间的延长,晶粒逐渐粗化,横向晶粒尺寸从37.6 nm(53 nm厚度)增加到192.� nm,对于886 nm厚的薄膜。这种微结构演变伴随着钻石拉曼峰的变窄和sp³相分数的单调增加,从95.9%增加到高达98.9%,表明随着生长时间的延长,非钻石碳的持续抑制。在相同的生长条件下,比较SiO₂和SiNₓ中间层显示晶粒尺寸和相纯度仅有微小差异,表明一旦建立了高成核密度,中间层的影响有限。重要的是,在480°C的基板温度下,实现了超过96%的sp³相含量的钻石薄膜,突显了在较低热预算下集成钻石在氧化镓上的可行性。这些发现建立了一个稳健且可扩展的平台,用于在β-氧化镓上集成钻石,支持下一代功率和射频器件的开发,具有改进的热管理性能。

英文摘要:

The integration of diamond with $β$-Ga$_2$O$_3$ presents a promising pathway to enhance thermal management in high-power electronic devices, where the inherently low thermal conductivity of $β$-Ga$_2$O$_3$ can lead to localized self-heating and elevated junction temperatures. In this work, we demonstrate a scalable, low-damage approach for integrating polycrystalline diamond films on (010) $β$-Ga$_2$O$_3$ substrates via microwave plasma chemical vapor deposition (MPCVD), employing dielectric interlayers and polymer-assisted electrostatic nanodiamond seeding to systematically evaluate the impact of growth conditions on film morphology, grain evolution, phase purity, and optical characteristics. At a growth temperature of 800$^\circ$C, progressive grain coarsening is observed with extended deposition, with the lateral grain size increasing from 37.6 nm (53 nm thickness) to 192.5 nm for an 886 nm-thick film. This microstructural evolution is accompanied by narrowing of the diamond Raman peak and a monotonic increase in the sp$^3$ phase fraction from 95.9\% to as high as 98.9\%, indicating continued suppression of non-diamond carbon with prolonged growth. Comparison of SiO$_2$ and SiN$_x$ interlayers under identical growth conditions shows only marginal differences in grain size and phase purity, indicating limited interlayer influence once a high nucleation density is established. Importantly, diamond films exhibiting greater than 96\% sp$^3$ phase content were achieved at substrate temperatures as low as 480$^\circ$C, highlighting the viability of diamond-on-Ga$_2$O$_3$ integration under reduced thermal budgets. These findings establish a robust and scalable platform for integrating diamond on $β$-Ga$_2$O$_3$, supporting the development of next-generation power and RF devices with improved thermal management.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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