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arXiv 2405.02668physics.app-ph
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室温 Si:S 势垒红外探测器,宽带响应可达 4.4μm

Room temperature Si:S barrier infrared detector with broadband response up to 4.4μm

He Zhu, Yunlong Xiao, Zhongyang Yu, Jiaqi Zhu, Qing Li, Zhenyu Ye, Xi Wang, Changlong Liu, Changyu Pan, Yufeng Shan, Junli Duan, Huizhen Wu, Weida Hu, Ning Dai

AI总结:

本文提出硫掺杂硅与能带势垒设计相结合的 Si:S 势垒红外探测器,通过分离暗电流与光电流抑制噪声并利用增益,实现室温下覆盖 1.12–4.4μm 的宽带响应,峰值量子效率达 2%,性能可比 III-V/IV-VI 探测器而成本仅千分之一。

摘要:

中红外光谱因其丰富的化学键信息,是化学分析、工业检测、环境等领域的关键工具。然而,现有中红外敏感材料复杂的生长或制造工艺阻碍了中红外探测器的大规模生产与应用。为解决这一问题,我们开发了采用硫掺杂硅和精细能带势垒设计的 Si:S 势垒探测器。由于暗电流与光电流的输运路径相互分离,该势垒设计在有效抑制暗电流的同时,允许光电流利用增益机制,从而显著提高信噪比。结果表明,该探测器除在可见光范围的本征响应外,其红外响应范围覆盖 1.12 至 4.4μm,峰值位于 3.3μm。其峰值量子效率比迄今报道的最佳中红外硅基探测器高出一个数量级,在室温下达到 2%。在 90K 时峰值探测率为 1.4E11 Jones @1.4V,在 210K 时降至 4.4E9 Jones @1.4V,与典型的 III-V 族和 IV-VI 族光电探测器相当,而制造成本仅为其千分之一。借助成熟的硅基制造工艺,该器件有望以更低价格实现大规模生产,为未来中红外探测提供高性价比的解决方案。

英文摘要:

Mid-infrared spectrum is a critical tool for chemical analysis, industrial inspection, environment, and other fields due to its rich chemical bond information. However, the complicated growth or fabrication procedures of existing mid-infrared sensitive materials hinder the large-scale production and utilization of mid-infrared detectors. To address this issue, we developed Si:S barrier detectors employing sulfur doped silicon and a sophisticated band barrier design. Since the transport of dark current and photo current is separated, the barrier design effectively suppresses the dark current while allowing the photo current to leverage gain mechanisms, thereby substantially improving signal-to-noise ratio. As a result, the detector exhibits an infrared response range covering from 1.12 to 4.4μm with a peak at 3.3μm, excluding its intrinsic response in visible range. Its peak quantum efficiency surpasses that of the best mid-infrared silicon-based detector reported to date by an order of magnitude, reaching 2% at room temperature. The peak detectivity at 90K is 1.4E11 Jones @1.4V and decreases to 4.4E9 Jones @1.4V, 210K, comparable to the typical III-V and IV-VI photodetectors at one thousandth fabrication cost. Leveraging the well-established silicon-based manufacturing process, this device holds promise for large-scale production at a reduced price, offering a cost-effective solution for future mid-infrared detection.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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