基于负载效应的三维微加工技术助力片上布里渊光机械学
Loading-effect-based 3-D microfabrication empowers on-chip Brillouin optomechanics
AI总结：
本文提出一种悬浮纳米线结构，结合基于负载效应的三维微加工技术，实现片上布里渊光机械学，获得高增益系数，推动大规模集成。
摘要：
受激布里渊散射（SBS）这一声光相互作用已成为实现集成光子学中关键组件和功能的基本原理。然而，集成布里渊器件的主要挑战是如何有效同时约束光波和声波。此外，这些器件的制造工艺需要与标准制造平台兼容，并简化以促进其大规模集成。在此，我们展示了一种新型的悬浮纳米线结构，能够紧密约束光子和声子。进一步地，针对该结构，我们引入了一种基于负载效应的三维微加工技术，该技术与互补金属氧化物半导体（CMOS）工艺兼容。这一创新技术允许通过单次光刻曝光制造整个结构，显著简化了制造流程。利用该结构和制造方案，我们在绝缘体上硅平台上实现了1100 1/W/m的布里渊增益系数，且占用紧凑的占地面积。它能够在适度的泵浦功率下支持超过4.1 dB的布里渊净增益。我们相信，该结构能够显著推动片上SBS的发展，为基于布里渊的光子器件的大规模集成开辟新的机遇。
英文摘要：
The acousto-optic interaction known as stimulated Brillouin scattering (SBS) has emerged as fundamental principles for realizing crucial components and functionalities in integrated photonics. However, the main challenge of integrated Brillouin devices is how to effectively confine both optical and acoustic waves. Apart from that, the manufacturing processes for these devices need to be compatible with standard fabrication platforms, and streamlined to facilitate their large-scale integration. Here, we demonstrate a novel suspended nanowire structure that can tightly confine photons and phonons. Furthermore, tailored for this structure, we introduce a loading-effect-based three-dimensional microfabrication technique, compatible with complementary metal-oxide-semiconductor (CMOS) technology. This innovative technique allows for the fabrication of the entire structure using a single-step lithography exposure, significantly streamlining the fabrication process. Leveraging this structure and fabrication scheme, we have achieved a Brillouin gain coefficient of 1100 1/W/m on the silicon-on-insulator platform within a compact footprint. It can support a Brillouin net gain over 4.1 dB with modest pump powers. We believe that this structure can significantly advance the development of SBS on chip, unlocking new opportunities for the large-scale integration of Brillouin-based photonic devices.
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