arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2208.09469cond-mat.mtrl-sci
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六方氮化硼薄膜的单向畴生长

Unidirectional domain growth of hexagonal boron nitride thin films

Abhijit Biswas, Qiyuan Ruan, Frank Lee, Chenxi Li, Sathvik Ajay Iyengar, Anand B. Puthirath, Xiang Zhang, Harikishan Kannan, Tia Gray, A. Glen Birdwell, Mahesh … 展开作者

Abhijit Biswas, Qiyuan Ruan, Frank Lee, Chenxi Li, Sathvik Ajay Iyengar, Anand B. Puthirath, Xiang Zhang, Harikishan Kannan, Tia Gray, A. Glen Birdwell, Mahesh R. Neupane, Pankaj B. Shah, Dmitry A. Ruzmetov, Tony G. Ivanov, Robert Vajtai, Manoj Tripathi, Alan Dalton, Boris I. Yakobson, Pulickel M. Ajayan

摘要:

二维范德华层状六方氮化硼(2D-vdW-h-BN)由于其非常规的畴生长形态、优异的性能以及作为二维纳米电子学介质层的应用潜力,近年来引起了人们极大的研究兴趣。然而,h-BN薄膜直接在绝缘衬底上的单向畴生长仍然具有显著的挑战性,因为高的键合各向异性和复杂的生长动力学比传统的薄膜生长,从而导致随机取向的畴形态的形成,并阻碍其在集成纳米器件中的有用性。在这里,超宽带隙h-BN薄膜通过脉冲激光沉积直接生长在低误切的原子级光滑的高度绝缘的c-平面蓝宝石衬底上(不使用任何金属催化层),显示出显著的单向三角形畴形态。密度泛函理论(DFT)计算表明,这种单向畴生长是由于降低了薄膜-衬底界面的对称性和能量,从而打破了无规畴成核点的简并性而导致的台阶边缘引导成核。通过广泛的表征,我们进一步证明了薄膜的优异的单晶样功能特性。我们的研究结果可能为在绝缘衬底上大面积直接生长电子质量的h-BN薄膜以实现高性能二维电子学铺平了道路,此外,还将有利于具有涌现现象的二维vdW材料的异质工程。

英文摘要:

Two-dimensional van der Waals (2D-vdW) layered hexagonal boron nitride (h-BN) has gained tremendous research interest over recent years due to its unconventional domain growth morphology, fascinating properties and application potentials as an excellent dielectric layer for 2D-based nano-electronics. However, the unidirectional domain growth of h-BN thin films directly on insulating substrates remains significantly challenging because of high-bonding anisotropicity and complex growth kinetics than the conventional thin films growth, thus resulting in the formation of randomly oriented domains morphology, and hindering its usefulness in integrated nano-devices. Here, ultra-wide bandgap h-BN thin films are grown directly on low-miscut atomically smooth highly insulating c-plane sapphire substrates (without using any metal catalytic layer) by pulsed laser deposition, showing remarkable unidirectional triangular-shape domains morphology. This unidirectional domain growth is attributed to the step-edge guided nucleation caused by reducing the film-substrate interfacial symmetry and energy, thereby breaking the degeneracy of nucleation sites of random domains, as revealed by the density functional theory (DFT) calculations. Through extensive characterizations, we further demonstrate the excellent single crystal-like functional properties of films. Our findings might pave the way for feasible large-area direct growth of electronic-quality h-BN thin films on insulating substrates for high-performance 2D-electronics, and in addition would be beneficial for hetero engineering of 2D-vdW materials with emergent phenomena.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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