arXiv 2201.021632022-01-06cond-mat.mtrl-sciphysics.app-ph

Au-Hf薄膜的光学性质

Optical properties of Au-Hf thin films

Hugh Littlehailes, William R. Hendren, Robert M. Bowman, Fumin Huang

备注：: 19 pages, including references, plus 3 pages of supplementary material. 8 figures and 1 table in main text, 1 figure and 1 table in supplementary material

摘要：

首次对金属间化合物Au $_{3}$ Hf的薄膜的光学性质进行了实验研究。与类似的合金，例如Au $_{3}$ Zr的膜相比，膜在所研究的大多数波长（370-1570 nm）上表现出更负的$ε'$值和更低的$ε''$值。Au $_{3}$ Hf薄膜的制备是通过直流磁控溅射在一系列的沉积温度，从室温到415 $^{o}$ C，并在不同的真空度退火。当沉积温度低于400 $^{o}$ C时，膜主要形成为Au $_{3}$ Hf、Au $_{2}$ Hf和Au $_{4}$ Hf相的组合，而在高于400 $^{o}$ C时，膜仅形成Au $_{3}$ Hf相，这表明隔离该相的关键条件。当在10 $^{-8}$ Torr下退火时，膜是稳定的，但是当再次在10 $^{-6}$ Torr下退火时，膜氧化并变成Au-Hf相的混合物，表明抗氧化性可能是高温下未封装应用的问题。

英文摘要：

The optical properties of thin films of intermetallic Au$_{3}$Hf were experimentally investigated for the first time, which display clear plasmonic properties in the optical and near infrared region with negative permittivity. In contrast to similar alloys, such as films of Au$_{3}$Zr, the films express more negative $ε'$ values and lower $ε''$ values across most of the wavelengths (370-1570 nm) investigated. The Au$_{3}$Hf films were fabricated by DC magnetron sputtering at a range of deposition temperatures, from room temperature to 415$^{o}$C, and annealed at different vacuum levels. The films mostly formed as a combination of Au$_{3}$Hf, Au$_{2}$Hf and Au$_{4}$Hf phases when deposited below 400$^{o}$C, and exclusively Au$_{3}$Hf phase at above 400$^{o}$C, indicating key conditions for isolating this phase. The films were stable when annealed at 10$^{-8}$ Torr, but when annealed again at 10$^{-6}$ Torr the films oxidised and changed into a mix of Au- Hf phases, suggesting resistance to oxidization may be an issue for un-encapsulated applications at elevated temperatures.

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英文摘要：

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