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arXiv 2201.00500cond-mat.mtrl-sci
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单轴应变诱导的 MoS$_2$ 单层电子性质改变

Uniaxial Strain-Induced Electronic Properties Alteration of MoS$_2$ Monolayer

A. Setiawan, I. P. Handayani, E. Suprayoga

AI总结:

该研究利用第一性原理计算揭示单轴应变对 MoS2 单层带隙、轨道态密度及电子跃迁的调控机制。

摘要:

二硫化钼(MoS$_2$)因其可由应变调控的电子和光学性质而引起关注,这使其成为应变工程器件应用中很有前景的候选材料。本研究采用第一性原理计算,考察单轴应变对 MoS$_2$ 单层电子性质的影响。结果表明,在应变为 1.743% 时,会发生从 K-K 直接带隙到 -K 间接带隙跃迁的转变。此外,观察到改变后的带隙与价带顶和导带底处 Mo-4d 及 S-3p 轨道的态密度(DOS)之间存在强关联。沿 a 晶轴的单轴应变调控原子间距,不仅以不同速率改变带隙,还会影响 Mo-4d 轨道的 DOS 以及可能的电子跃迁。本研究阐明了二维 MoS2 单层电子结构改变的机制,这可能影响谷间跃迁。

英文摘要:

Molybdenum disulfide (MoS$_2$) has attracted interest owing to its strain-tuned electronic and optical properties, making it a promising candidate for applications in strain engineering devices. In this study, we investigate the effect of uniaxial strain on the electronic properties of MoS$_2$ monolayer using first-principles calculations. Results show that a crossover of the K-K direct to -K indirect bandgap transitions occur at a strain of 1.743%. Moreover, a strong correlation is observed between the modified bandgap and the density of states (DOS) of the Mo-4d and S-3p orbitals at the valence band maximum and conduction band minimum. The uniaxial strain-tuned interatomic distance along the a-crystallographic axis does not only alter the bandgap at different rates but also affects the DOS of the Mo-4d orbital and possible electronic transitions. This study clarifies the mechanism of the electronic structural modification of two-dimensional MoS2 monolayer, which may affect intervalley transitions.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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