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arXiv 2109.00804cond-mat.mes-hallcond-mat.mtrl-sci
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石墨烯氟化的第一性原理新见解

Novel First-Principles Insights into Graphene Fluorination

Tahereh Malakoutikhah, S. Javad Hashemifar, Mojtaba Alaei

摘要:

全面的第一性原理计算进行不同的安排,相关的化学缺陷的氟代石墨烯,以提供准确的微观洞察到石墨烯的过程。为了更好地理解这些现象,计算了半周期和全周期过程的最小能量路径。虽然实验观察表明,一个慢得多的速率的全氟化过程中,与半氟化酮相比,所获得的能量分布表明大大增强氟吸附后的半氟化阶段。这种不确定性是根据半结晶后石墨烯片的显著化学活化来解释的,这显著地促进了系统中化学污染物的形成,从而大大减缓了全结晶过程。在考虑了相关化学物种(包括氢、氧和氮分子以及氙原子)的结合能和耐久性之后,认为氧-氟配体是最有可能对抗石墨烯片的全覆盖的化学污染物。我们提出了一个氧解吸机制的原子描述的全脱附过程中的现实情况。有人认为,所提出的机制很好地解释了在高温下的全反射过程的速率大大提高。

英文摘要:

Comprehensive first-principles calculations are performed on diverse arrangements of relevant chemical defects in fluorographene to provide accurate microscopic insights into the process of graphene fluorination. The minimum energy paths for the half- and full-fluorination processes are calculated for a better understanding of these phenomena. While experimental observations indicate a much slower rate of the full-fluorination process, compared with the half-fluorination one, the obtained energy profiles demonstrate much enhanced fluorine adsorption after the half-fluorination stage. This ambiguity is explained in terms of significant chemical activation of the graphene sheet after half-fluorination, which remarkably facilitates the formation of chemical contaminants in the system and thus substantially slows down the full-fluorination procedure. After considering the binding energy and durability of the relevant chemical species, including hydrogen, oxygen, and nitrogen molecules and xenon atom, it is argued that oxygen-fluorine ligands are the most likely chemical contaminants opposing the full-fluorination of a graphene sheet. We propose an oxygen desorption mechanism for the atomic description of the full-fluorination procedure in realistic situations. It is argued that the proposed mechanism explains well much enhanced rate of the full-fluorination procedure at elevated temperatures.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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