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arXiv 2106.07698cond-mat.str-el
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电子-电子相互作用修正下Bi $_2$ Se $_3$薄膜各向异性磁导的深入分析

In-depth Analysis of Anisotropic Magnetoconductance in Bi$_2$Se$_3$ thin films with electron-electron interaction corrections

Satyaki Sasmal, Joynarayan Mukherjee, Dhavala Suri, Karthik V. Raman

摘要:

拓扑绝缘体(TI)的面外和面内磁导(MC)研究是研究拓扑表面态(TSS)弱反局域化(WAL)响应的一种实验方法。然而,除了上述的WAL响应,弱本地化(WL)的贡献,从导电体状态也被称为共存,并有助于整体MC;一项研究,到目前为止,受到了有限的关注。本文通过系统分析Bi $_2$ Se $_3$薄膜的电导率随温度和磁场的变化关系,准确地提取了上述WL贡献。为了准确的分析,我们量化的电子-电子相互作用的测量MC这是经常被忽略在最近的WAL研究的贡献。此外,我们表明,WAL效应所产生的TSS与有限的穿透深度,为面外和面内磁场可以一起解释各向异性磁导(AMC),因此,研究AMC研究可以作为一个有用的技术来探测参数,如相位相干长度和穿透深度,在3D TI中的TSS。我们还表明,在体无序的增加,实现了通过非晶SiO $_2$衬底上生长的薄膜,而不是结晶Al $_2$ O $_3$(0001),可以导致更强的退耦膜的顶部和底部表面状态之间。

英文摘要:

A combination of out-of-plane and in-plane magnetoconductance (MC) study in topological insulators (TI) is often used as an experimental technique to probe weak anti-localization (WAL) response of the topological surface states (TSSs). However, in addition to the above WAL response, weak localization (WL) contribution from conducting bulk states are also known to coexist and contribute to the overall MC; a study that has so far received limited attention. In this article, we accurately extract the above WL contribution by systematically analyzing the temperature and magnetic field dependency of conductivity in Bi$_2$Se$_3$ films. For accurate analysis, we quantify the contribution of electron-electron interactions to the measured MC which is often ignored in recent WAL studies. Moreover, we show that the WAL effect arising from the TSSs with finite penetration depth, for out-of-plane and in-plane magnetic field can together explain the anisotropic magnetoconductance (AMC) and, thus, the investigated AMC study can serve as a useful technique to probe the parameters like phase coherence length and penetration depth that characterise the TSSs in 3D TIs. We also demonstrate that increase in bulk-disorder, achieved by growing the films on amorphous SiO$_2$ substrate rather than on crystalline Al$_2$O$_3$(0001), can lead to stronger decoupling between the top and bottom surface states of the film.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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