寻找难熔等离子体材料：Au $_{3}$ Zr金属间化合物薄膜的结构和光学性质
Searching for refractory plasmonic materials: the structural and optical properties of Au$_{3}$Zr intermetallic thin films
摘要：
首次对Au $_{3}$ Zr难熔金属间化合物薄膜的光学性质进行了实验研究，在可见光和近红外区域表现出独特的等离子体特性。通过直流磁控溅射在从室温到427 $^{o}$ C的各种沉积温度下制备薄膜，并在不同的真空度下退火。结构和光学性质被发现是严重依赖于沉积温度和退火条件。在205-320 $^{o}$ C之间沉积的膜显示出较低的负介电常数和较好的热稳定性，这可能与特定的晶体取向有关。当在10 $^{-8}$ Torr下退火时，薄膜是稳定的，但当在10 $^{-6}$ Torr下退火时，薄膜被部分氧化，这表明氧化可能是周围环境中高温应用的限制问题。
英文摘要：
Optical properties of refractory intermetallic thin films of Au$_{3}$Zr were experimentally investigated for the first time, which show distinctive plasmonic properties in the visible and near infrared region. The films were fabricated through DC magnetron sputtering at various deposition temperature ranging from room temperature to 427$^{o}$C and annealed at different vacuum levels. Both the structural and optical properties are found to be critically dependent on deposition temperature and anneal conditions. Films deposited between 205-320$^{o}$C are shown to exhibit lower negative permittivity and better thermal stability, which could be linked to specific crystalline orientations. The films are stable when annealed at 10$^{-8}$ Torr, but are partially oxidized when annealed at 10$^{-6}$ Torr, suggesting oxidization could be a restricting issue for high-temperature applications in ambient environment.
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