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arXiv 2102.01283cond-mat.mtrl-sci
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W/Co/Pt三层膜中轨道矩各向异性、磁晶各向异性与Dzyaloshinskii-Moriya相互作用的关系研究

On the relationship between orbital moment anisotropy, magnetocrystalline anisotropy, and Dzyaloshinskii-Moriya interaction in W/Co/Pt trilayers

Zhendong Chi, Yong-Chang Lau, Vanessa Li Zhang, Goro Shibata, Shoya Sakamoto, Yosuke Nonaka, Keisuke Ikeda, Yuxuan Wan, Masahiro Suzuki, Masashi Kawaguchi, Masa… 展开作者

Zhendong Chi, Yong-Chang Lau, Vanessa Li Zhang, Goro Shibata, Shoya Sakamoto, Yosuke Nonaka, Keisuke Ikeda, Yuxuan Wan, Masahiro Suzuki, Masashi Kawaguchi, Masako Suzuki-Sakamaki, Kenta Amemiya, Naomi Kawamura, Masaichiro Mizumaki, Motohiro Suzuki, Hyunsoo Yang, Masamitsu Hayashi, Atsushi Fujimori

AI总结:

本研究通过分析W/Co/Pt三层膜中MCA、DMI、OMA随Co层厚度的变化规律,结合XMCD测试,揭示了三者的界面起源关联,并解释了小厚度下DMI下降的应变/织构成因。

摘要:

为阐明W/Co/Pt三层膜中磁晶各向异性(MCA)、Dzyaloshinskii-Moriya相互作用(DMI)与轨道矩各向异性(OMA)三者的关联,我们研究了上述三种特性对Co层厚度的依赖关系。研究发现,MCA倾向于让磁化方向沿薄膜法线方向,且其强度随有效磁层厚度($t_\text{eff}$)减小而单调上升。Dzyaloshinskii-Moriya交换常数的大小($|D|$)随$t_\text{eff}$减小先增大,在$t_\text{eff}\thicksim1$nm时达到峰值,当$t_\text{eff}$低于该值后$|D|$转而下降。当$t_\text{eff}$大于约1nm时,MCA与$|D|$均与$1/t_\text{eff}$呈比例关系,表明二者均起源于界面效应。当$t_\text{eff}$低于约1nm后,MCA仍随$t_\text{eff}$减小而上升,但上升速率有所放缓。为厘清MCA和DMI的$t_\text{eff}$依赖关系的成因,我们利用X射线磁圆二色性(XMCD)研究了W/Co/Pt三层膜中Co的OMA。结果表明,当$t_\text{eff}$小于约0.8nm时存在非零OMA,且OMA随$t_\text{eff}$减小的增长速率快于MCA的预期增长速率,说明在小$t_\text{eff}$条件下,除OMA外还有其他因素对MCA有贡献。OMA的$t_\text{eff}$依赖关系还表明,当$t_\text{eff}$小于约1nm时,$|D|$与界面处的OMA无关。我们提出,Co在W表面生长时产生的应变和/或织构,会在小$t_\text{eff}$下降低界面DMI,且在一定程度上降低MCA。

英文摘要:

We have studied the Co layer thickness dependences of magnetocrystalline anisotropy (MCA), Dzyaloshinskii-Moriya interaction (DMI), and orbital moment anisotropy (OMA) in W/Co/Pt trilayers, in order to clarify their correlations with each other. We find that the MCA favors magnetization along the film normal and monotonically increases with decreasing effective magnetic layer thickness ($t_\mathrm{eff}$). The magnitude of the Dzyaloshinskii-Moriya exchange constant ($|D|$) increases with decreasing $t_\mathrm{eff}$ until $t_\mathrm{eff} \sim$1 nm, below which $|D|$ decreases. The MCA and $|D|$ scale with $1/t_\mathrm{eff}$ for $t_\mathrm{eff}$ larger than $\sim$1 nm, indicating an interfacial origin. The increase of MCA with decreasing $t_\mathrm{eff}$ continues below $t_\mathrm{eff}$ $\sim$ 1 nm, but with a slower rate. To clarify the cause of the $t_\mathrm{eff}$ dependences of MCA and DMI, the OMA of Co in W/Co/Pt trilayers is studied using x-ray magnetic circular dichroism (XMCD). We find non-zero OMA when $t_\mathrm{eff}$ is smaller than $\sim$0.8 nm. The OMA increases with decreasing $t_\mathrm{eff}$ more rapidly than what is expected from the MCA, indicating that factors other than OMA contribute to the MCA at small $t_\mathrm{eff}$. The $t_\mathrm{eff}$ dependence of the OMA also suggests that $|D|$ at $t_\mathrm{eff}$ smaller than $\sim$1 nm is not related to the OMA at the interface. We propose that the growth of Co on W results in a strain and/or texture that reduces the interfacial DMI, and, to some extent, MCA at small $t_\mathrm{eff}$.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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