外延结晶与材料相变过程中原位硬X射线纳米束表征装置
Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations
AI总结:
针对固相外延等三维结晶过程的纳米尺度表征难题,研发了集成紧凑沉积系统的原位同步辐射硬X射线纳米束表征装置,可实现沉积与结晶过程的多模态表征,并通过SrTiO₃/BaTiO₃多层膜实验验证了其可行性。
摘要:
固相外延(SPE)及其他三维外延结晶过程带来了颇具挑战性的结构与化学表征难题。缺陷浓度、弹性应变的空间分布以及离子的化学态均随纳米级特征长度尺度变化,且对生长过程中的气体环境与弹性边界条件高度敏感。在典型结晶时长内,SPE中晶界的横向或三维传播具有纳米级或亚微米级特征距离。一台原位同步辐射硬X射线装置可利用衍射、共振散射、纳米束与相干衍射成像以及反射率测量,在沉积与结晶过程中研究这些特征。该装置集成了一套紧凑的沉积系统,可适配短工作距离的X射线聚焦光学元件。薄膜层通过射频磁控溅射与蒸发源进行沉积。沉积系统可控制气体氛围与样品温度。样品采用稳定的机械设计进行定位,以最大程度降低振动与漂移,并配备精密位移台以支持纳米束实验。对SrTiO₃/BaTiO₃多层膜的非晶薄膜沉积过程的原位X射线表征结果,验证了该装置的应用可行性。
英文摘要:
Solid-phase epitaxy (SPE) and other three-dimensional epitaxial crystallization processes pose challenging structural and chemical characterization problems. The concentration of defects, the spatial distribution of elastic strain, and the chemical state of ions each vary with nanoscale characteristic length scales and depend sensitively on the gas environment and elastic boundary conditions during growth. The lateral or three-dimensional propagation of crystalline interfaces in SPE has nanoscale or submicron characteristic distances during typical crystallization times. An in situ synchrotron hard x-ray instrument allows these features to be studied during deposition and crystallization using diffraction, resonant scattering, nanobeam and coherent diffraction imaging, and reflectivity. The instrument incorporates a compact deposition system allowing the use of short-working-distance x-ray focusing optics. Layers are deposited using radio-frequency magnetron sputtering and evaporation sources. The deposition system provides control of the gas atmosphere and sample temperature. The sample is positioned using a stable mechanical design to minimize vibration and drift and employs precise translation stages to enable nanobeam experiments. Results of in situ x-ray characterization of the amorphous thin film deposition process for a SrTiO3/BaTiO3 multilayer illustrate implementation of this instrument.
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