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arXiv 2007.12639physics.acc-phphysics.plasm-ph
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束流驱动等离子体尾场加速器中的受控密度下降斜坡注入

Controlled density-downramp injection in a beam-driven plasma wakefield accelerator

Alexander Knetsch, Bridget Sheeran, Lewis Boulton, Pardis Niknejadi, Kristjan Põder, Lucas Schaper, Ming Zeng, Simon Bohlen, Gregory Boyle, Theresa Brümmer, Jam… 展开作者

Alexander Knetsch, Bridget Sheeran, Lewis Boulton, Pardis Niknejadi, Kristjan Põder, Lucas Schaper, Ming Zeng, Simon Bohlen, Gregory Boyle, Theresa Brümmer, James Chappell, Richard D'Arcy, Severin Diederichs, Brian Foster, Matthew James Garland, Pau Gonzalez Caminal, Bernhard Hidding, Vladislav Libov, Carl Andreas Lindstrøm, Alberto Martinez de la Ossa, Martin Meisel, Trupen Parikh, Bernhard Schmidt, Sarah Schröder, Gabriele Tauscher, Stephan Wesch, Paul Winkler, Jonathan Wood, Jens Osterhoff

摘要:

本文介绍了利用束流驱动的等离子体尾场加速实现高品质的等离子体阴极通过密度下降斜坡注入在短的注入器阶段在FLASHForward设施在DESY。电子束的电荷高达105 pC和百分之几的能量扩展加速的可调有效加速场高达2.7 GV/m。等离子体阴极以非常高的注入效率无漂移地操作。研究和模拟了产生的束的抖动、发射度和发散度的来源,以及用于性能改进的策略,这些策略将进一步增加具有所展示的操作稳定性的等离子体阴极的广泛应用

英文摘要:

This paper describes the utilization of beam-driven plasma wakefield acceleration to implement a high-quality plasma cathode via density-downramp injection in a short injector stage at the FLASHForward facility at DESY. Electron beams with charge of up to 105 pC and energy spread of a few percent were accelerated by a tunable effective accelerating field of up to 2.7 GV/m. The plasma cathode was operated drift-free with very high injection efficiency. Sources of jitter, the emittance and divergence of the resulting beam were investigated and modeled, as were strategies for performance improvements that would further increase the wide-ranging applications for a plasma cathode with the demonstrated operational stability

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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