arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2005.11377cond-mat.mtrl-sciphysics.comp-ph
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用于高迁移率电子器件的单层2D半导体碲化物

Monolayer 2D semiconducting tellurides for high-mobility electronics

Huta R. Banjade, Jinbo Pan, Qimin Yan

摘要:

发现和设计具有合适带隙和高载流子迁移率的二维(2D)材料对于光子学、光电子学和高速电子学至关重要。本文基于第一性原理计算,采用具有PBE和HSE泛函的密度泛函理论(DFT),引入了一个具有单层结构的半导体碲化物M2 N2 Te 8(M = {Ti,Zr,Hf},N= {Si,Ge}).这些化合物已被鉴定为具有1.0 eV至1.31 eV的直接带隙,非常适合于光子学和光电子学应用。此外,观察到各向异性的面内输运行为和小的电子和空穴(0.11 - 0.15毫微电子)的有效质量被确定沿主导的传输方向。超高的载流子迁移率被预测为这个家庭的二维化合物主机在高速电子器件的潜在应用的巨大希望。电子结构的详细分析揭示了这种独特的二维碲化物材料的有前途的性质的起源。

英文摘要:

Discovery and design of two-dimensional (2D) materials with suitable band gaps and high carrier mobility is of vital importance for photonics, optoelectronics, and high-speed electronics. In this work, based on first principles calculations using density functional theory (DFT) with PBE and HSE functionals, we introduce a family of monolayer isostructural semiconducting tellurides M2N2Te8, with M = {Ti, Zr, Hf} and N= {Si, Ge}. These compounds have been identified to possess direct band gaps from 1.0 eV to 1.31 eV, which are well suited for photonics and optoelectronics applications. Additionally, anisotropic in-plane transport behavior is observed and small electron and hole (0.11 - 0.15 me) effective masses are identified along the dominant transport direction. Ultra-high carrier mobility is predicted for this family of 2D compounds which host great promise for potential applications in high-speed electronic devices. Detailed analysis of electronic structures reveals the origins of the promising properties of this unique class of 2D telluride materials.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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