空间分辨的绝缘体-金属相变双折射光栅
Spatially-resolved insulator-metal transition for rewritable optical gratings
摘要：
掺杂是调节金属氧化物1 -5的性质以获得功能氧化物电子6 -8的有效方法。此前，我们通过使用电子-质子协同掺杂策略开发了一种在环境条件下可控的氢掺杂技术，该技术使人们能够摆脱传统技术所需的高温/高压处理9。在这里，基于这种简单的掺杂路线，我们实现了一个可视的和可逆的绝缘体-金属转变（MIT）的三氧化钨（WO 3）薄膜。其出色的空间选择性可与标准UV光刻相媲美，这显示出成为一种可行的方法来制造WO 3光栅器件的潜力。此外，所获得的WO 3结构光栅的周期还可以通过掺杂区域的选择而容易地根据需要改变。这种先进的掺杂技术不仅为开发光学器件，还为开发可重写离子器件和各种氧化物电子器件的集成电路开辟了替代方法。
英文摘要：
Doping is an effective way to tune the property of metal oxides1-5, for achieving functional oxide electronics6-8. Previously we developed a controllable hydrogen doping technology at ambient conditions by use of electron-proton synergistic doping strategy, which enables one to get rid of high-temperature/pressure treatments required by traditional technologies9. Here, based on this facile doping route, we achieve a visual and reversible insulator-metal transition (MIT) for tungsten trioxide (WO3) film. Its outstanding spatial selection is comparable to standard UV lithography, which shows the potential of becoming a viable way for rewritable WO3 grating device fabrication. Furthermore, the period of the obtained WO3 structural grating can also be easily changed for requirement by doping area selection. This advanced doping technology opens up alternative approaches for developing not only optical devices, but also rewritable ions devices and integrated circuits for various oxide electronics.
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