Highly flexible electromagnetic interference shielding films based on ultrathin Ni/Ag composites on paper substrates

稳定不同基底上的超薄银(Ag)薄膜

Stabilizing ultrathin Silver (Ag) films on different substrates

本文提出利用填充金属Zn在多种基底上稳定超薄Ag薄膜的方法，通过形成三维化学梯度界面，使薄膜获得低电阻、高透明度与良好稳定性，为光电及等离激元器件提供了经济可行的电极设计方案。

Room Temperature deposition of ZnO and Al:ZnO ultrathin films on glass and PET substrates by DC sputtering Technique

In the present work, ultrathin films of Zinc oxide (ZnO) and Aluminum doped zinc oxide (AZO) with 20 nm thick were fabricated at 300 K on glass and Polyethylene terephthalate (PET) substrates by means of directcurrent sputtering method. The structural morphology of the films were analyzed by (XRD) diffractometry. The average transmittance of films deposited on different substrates showed high transparency (over 80%) in the visible spectrum. The objective of the present work is to investigate the thicknesses and optical constants of ZnO and AZO ultrathin films prepared by DC sputtering onto (gl…

通过LPCVD优化在介电基板上超薄六方氮化硼的生长条件

Optimization for growth condition of ultrathin hexagonal boron nitride on dielectric substrates via LPCVD

通过LPCVD优化在介电基板上直接合成超薄h-BN薄膜，以提升深紫外光电探测器的性能。

Comparison the optical properties for Bi2O3 and NiO ultrathin films deposited on different substrates by DC sputtering technique for transparent electronics

Bismuth and Nickel transparent oxides thin films were grown on glass and flexible polythelene terephalate (PET) substrates by DC sputtering technique at room temperature 300 K. The structures of Bi2O3 and NiO films were analyzed by X-ray diffraction (XRD) analyses and scanning electron microscopy (SEM). A profilometry is used to measure the thicknesses of the ultrathin films. These values were established by a spectro-ellipsometry technique with a new amorphous dispersion model in the range of 200 nm to 2200 nm with one nm increment. In addition, the optical constants of these films were inves…

Direct atomic layer deposition of ultrathin aluminium oxide on monolayer $MoS_2$ exfoliated on gold: the role of the substrate

In this paper we demonstrated the thermal Atomic Layer Deposition (ALD) growth at 250 °C of highly homogeneous and ultra-thin ($\approx$ 3.6 nm) $Al_2O_3$ films with excellent insulating properties directly onto a monolayer (1L) $MoS_2$ membrane exfoliated on gold. Differently than in the case of 1L $MoS_2$ supported by a common insulating substrate ($Al_2O_3/Si$), a better nucleation process of the high-k film was observed on the 1L $MoS_2/Au$ system since the ALD early stages. Atomic force microscopy analyses showed a $\approx 50\%$ $Al_2O_3$ surface coverage just after 10 ALD cycles, its in…

超薄Ti3C2Tx MXene薄膜中的红外异常现象

Infrared anomalies in ultrathin Ti3C2Tx MXene films

本研究提出无胶带转移法制备厘米级超薄Ti3C2Tx MXene薄膜，测得其红外光学特性，发现三种红外异常现象，为低辐射透明薄膜等器件设计提供指导。