Room Temperature deposition of ZnO and Al:ZnO ultrathin films on glass and PET substrates by DC sputtering Technique

Exploring co-sputtering of ZnO:Al and SiO2 for efficient electron-selective contacts on silicon solar cells

In recent years, considerable efforts have been devoted to developing novel electron-selective materials for crystalline Si (c-Si) solar cells with the attempts to simplify the fabrication process and improve efficiency. In this study, ZnO:Al (AZO) is co-sputtered with SiO2 to form AZO:SiO2 films with different SiO2 content. These nanometer-scale films, deposited on top of thin intrinsic hydrogenated amorphous silicon films and capped with low-work-function metal (such as Al and Mg), are demonstrated to function effectively as electron-selective contacts in c-Si solar cells. On the one hand, A…

直流磁控溅射制备Cr掺杂ZnO薄膜的结构、光学及介电性能

Structural, optical, and dielectric properties of Cr-doped ZnO films via DC magnetron sputtering

本研究通过直流磁控溅射沉积Cr-Zn层后空气退火制备Cr掺杂ZnO薄膜，分析其结构、光学及介电性能，发现最佳掺杂量可提升薄膜透光率与导电性，方法可扩展至其他掺杂ZnO薄膜。

Optical constants of DC sputtering derived ITO, TiO2 and TiO2:Nb thin films characterized by spectrophotometry and spectroscopic ellipsometry for optoelectronic devices

Thin films of inorganic materials as Tin-doped indium oxide, titanium oxide, Niobium doped titanium oxide, were deposited for comparison on glass and Polyethylene terephthalate (PET) substrates with a DC sputtering method. These thin films have been characterized by different techniques: Dektak Surface Profilometer, X-ray diffraction (XRD), SEM, (UV/Vis/NIR) spectrophotometer and spectroscopic ellipsometry (SE). The optical parameters of these films such as transmittance, reflectance, refractive index, extinction coefficient, energy gap obtained with different electronic transitions, real and …

基于SiC衬底的ZnO基高泛音体声波谐振器超越5 GHz激励

Beyond 5 GHz excitation of a ZnO-based high-overtone bulk acoustic resonator on SiC substrate

本文报道了SiC衬底上Au/ZnO/Pt高泛音体声波谐振器的制备与表征，实现了高达7 GHz的谐振和5.25 GHz最强激励，f·Q值达4.1×10^13 Hz，为ZnO基器件最高。

Comparison the optical properties for Bi2O3 and NiO ultrathin films deposited on different substrates by DC sputtering technique for transparent electronics

Bismuth and Nickel transparent oxides thin films were grown on glass and flexible polythelene terephalate (PET) substrates by DC sputtering technique at room temperature 300 K. The structures of Bi2O3 and NiO films were analyzed by X-ray diffraction (XRD) analyses and scanning electron microscopy (SEM). A profilometry is used to measure the thicknesses of the ultrathin films. These values were established by a spectro-ellipsometry technique with a new amorphous dispersion model in the range of 200 nm to 2200 nm with one nm increment. In addition, the optical constants of these films were inves…

One-Step Formation of Plasmonic Cu Nanodomains in p-Type Cu$_2$O Matrix Films for Enhanced Photoconversion of n-ZnO/p-Cu$_2$O Heterojunctions

Plasmonic Cu nanoparticles were in-situ grown into a Cu$_2$O semiconductor matrix by using reactive magnetron sputtering and adjusting the amount of oxygen available during the synthesis in order to prevent the oxidation of part of copper atoms landed on the film surface. Varying only the oxygen flowrate (OFR) and using a single Cu target it was possible to observe the evolution in the simultaneous formation of metallic Cu and Cu$_2$O phases for oxygen-poor conditions. Suchformation is accompanied by the development of the surface plasmon band (SPB) corresponding to Cu, as evidenced by UV-Vis …