arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2001.05386cond-mat.mtrl-sci
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闪锌III-V族/IV族外延:错切的重要性

Zinc-Blende group III-V/group IV epitaxy: importance of the miscut

C. Cornet, S. Charbonnier, I. Lucci, L. Chen, A. Letoublon, A. Alvarez, K. Tavernier, T. Rohel, R. Bernard, J. -B. Rodriguez, L. Cerutti, E. Tournie, Y. Leger, … 展开作者

C. Cornet, S. Charbonnier, I. Lucci, L. Chen, A. Letoublon, A. Alvarez, K. Tavernier, T. Rohel, R. Bernard, J. -B. Rodriguez, L. Cerutti, E. Tournie, Y. Leger, G. Patriarche, L. Largeau, A. Ponchet, P. Turban, N. Bertru

摘要:

在这里,我们澄清了在III-V族/IV族晶体生长过程中的错切的核心作用。我们发现,错切首先影响初始反相域分布,有两个不同的成核驱动和梯田驱动制度。然后,推断如何反相畴分布,平均相位和平均横向长度的影响,由错切。通过比较名义和邻位Si衬底上生长的GaP和GaSb/AlSb样品中的反相畴分布,给出了实验证实。用扫描隧道显微镜在原子尺度上观察到了GaP/Si样品的反相畴埋台阶。由错切产生的步骤允许晶体的两相之间的生长速率不平衡,并且生长条件可以深刻地修改不平衡系数,如GaAs/Si所示。最后,我们解释了如何单畴III-V半导体配置可以实现即使在低误切基板。

英文摘要:

Here, we clarify the central role of the miscut during group III-V/ group IV crystal growth. We show that the miscut first impacts the initial antiphase domain distribution, with two distinct nucleation-driven and terraces-driven regimes. It is then inferred how the antiphase domain distribution mean phase and mean lateral length are affected by the miscut. An experimental confirmation is given through the comparison of antiphase domain distributions in GaP and GaSb/AlSb samples grown on nominal and vicinal Si substrates. The antiphase domain burying step of GaP/Si samples is then observed at the atomic scale by scanning tunneling microscopy. The steps arising from the miscut allow growth rate imbalance between the two phases of the crystal and the growth conditions can deeply modify the imbalance coefficient, as illustrated with GaAs/Si. We finally explain how a monodomain III-V semiconductor configuration can be achieved even on low miscut substrates.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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