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arXiv 1807.03752physics.optics
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电聚焦可调透镜单光束反射法测定半导体薄膜的非线性refractive index

Single-beam reflection technique for determination of nonlinear-refractive index of thin-film semiconductors using an electrically focus tunable lens

Juan Serna, Julián Henao, Edgar Rueda, Abdullatif Hamad, Hernando Garcia

摘要:

本文提出了一种测量半导体薄膜非线性折射率n_2的反射式F扫描技术。在该技术中,使用电可调焦透镜将p偏振高斯光束聚焦到样品上,该样品定位在距透镜固定距离处并且相对于光轴形成角度。由于EFTL具有在施加电流时在特定范围内改变其焦距的能力。电可调焦透镜在特定范围内根据施加的电流改变其焦距,因此,当光聚焦在样品表面上时,光束强度足够高以产生非线性光学效应,例如材料折射率的变化。然后,这种变化被记录为反射率的变化,由强度检测器测量。三维CH 3 NH 3 PbBr 3混合钙钛矿薄膜的结果。

英文摘要:

In this paper, we propose a technique named reflection F-scan or RF-scan, that can be used to measure the nonlinear-refractive index n_2 of thin-film semiconductors. In this technique, a p-polarized Gaussian beam is focused using an electrically focus-tunable lens onto a sample, which is positioned at a fixed distance from the lens and makes an angle with respect to the optical axis. Due to EFTL has the capability to vary its focal distance over a specific range when an electric current is applied to it. The electrically focus-tunable lens varies its focal distance as a function of an applied electric current over a specific range thus, when light is focused on the surface of the sample the beam intensity is high enough to generate nonlinear optical effects such as changes in the refractive index of the material. This changes are then register as variations in reflectance, measured by an intensity detector. Results for three-dimensional CH3NH3PbBr3 hybrid perovskite thin films are presented.

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