1 K以下固态氖中稳定氢原子的电子自旋共振研究
Electron spin resonance study of atomic hydrogen stabilized in solid neon below 1K
摘要：
本文报道了在4.6T的高场和低于1 K的温度下，用电子自旋共振方法研究了固体Ne基质中稳定的氢原子。在$\sim$ 1 K的温度下缓慢沉积在衬底上的Ne的膜表现出高度的孔隙率。我们发现，H原子可能被困在两个不同的替代位置的Ne晶格以及内部的纯分子H $_{2}$在Ne膜的孔的集群。后一种类型的原子在0.3-0.6 $\,$ K的温度下对复合非常不稳定。基于所观察到的几乎瞬间衰减后，快速小的温度升高，我们评估的复合速率常数的下限$k_{r}\geq5\cdot10^{-20}\,$ cm $^{3}$ s $^{-1}$在0.6 $\,$ K，5个数量级大于以前发现的薄膜中的纯H $_{2}$在相同的温度。这种行为假定原子的迁移率非常高，并且可以指示某些尺寸的H $_{2}$簇的固-液转变，类似于在氦液滴内的H $_{2}$簇的实验中观察到的（Phys. Rev. Lett 101，205301（2008））。我们发现，H $_{2}$在氖膜中的解离效率比纯H $_{2}$中的解离效率提高了2个数量级，这是由强烈的次级电子发射引起的。
英文摘要：
We report on an electron spin resonance study of atomic hydrogen stabilized in a solid Ne matrices carried out at a high field of 4.6 T and temperatures below 1 K. The films of Ne, slowly deposited on the substrate at the temperature $\sim$1 K, exhibited a high degree of porosity. We found that H atoms may be trapped in two different substitutional positions in the Ne lattice as well as inside clusters of pure molecular H$_{2}$ in the pores of the Ne film. The latter type of atoms was very unstable against recombination at temperatures 0.3-0.6$\,$K. Based on the observed nearly instant decays after rapid small increase of temperature, we evaluate the lower limit of the recombination rate constant $k_{r}\geq5\cdot10^{-20}\,$cm$^{3}$s$^{-1}$ at 0.6$\,$K, five orders of magnitude larger than that previously found in the thin films of pure H$_{2}$ at the same temperature. Such behavior assumes a very high mobility of atoms and may indicate a solid-to-liquid transition for H$_{2}$ clusters of certain sizes, similar to that observed in experiments with H$_{2}$ clusters inside helium droplets (Phys. Rev. Lett 101, 205301 (2008)). We found that the efficiency of dissociation of H$_{2}$ in neon films is enhanced by 2 orders of magnitude compared to that in pure H$_{2}$, which is instigated by a strong emission of secondary electrons.
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