离子损伤金刚石中refractive index的可控变化
Controlled variation of the refractive index in ion-damaged diamond
摘要：
在金刚石基光学和光子器件的制造中，折射率随结构损伤的变化的精细控制是必不可少的。我们在此报告了在中低能量注量（10^13 - 10^17离子cm^-2）下，用2 MeV和3 MeV质子损伤高质量单晶金刚石后，在λ =632.8 nm处折射率实部的变化。用光栅扫描离子微束将样品注入125 x125 um^2区域后，用激光干涉显微镜测量注入区域光学厚度的变化。根据具体的损伤轮廓，用模型对结果进行了分析。该技术允许直接制造的光学结构在散装金刚石的基础上的局部变化的折射率，这将是在未来的工作中探索。
英文摘要：
A fine control of the variation of the refractive index as a function of structural damage is essential in the fabrication of diamond-based optical and photonic devices. We report here about the variation of the real part of the refractive index at lambda=632.8 nm in high quality single crystal diamond damaged with 2 and 3 MeV protons at low-medium fluences (10^13 - 10^17 ions cm^-2). After implanting the samples in 125x125 um^2 areas with a raster scanning ion microbeam, the variation of optical thickness of the implanted regions was measured with laser interferometric microscopy. The results were analyzed with a model based on the specific damage profile. The technique allows the direct fabrication of optical structures in bulk diamond based on the localized variation of the refractive index, which will be explored in future works.
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