质子损伤金刚石中复杂的refractive index变化
Complex refractive index variation in proton-damaged diamond
摘要：
在离子注入等微细加工过程中，对单晶金刚石光学性质的精确控制在集成光子器件的工程中起着至关重要的作用。在这项工作中，我们对单晶金刚石在中低能量注量（范围：10^15 - 10^17 cm^-2）下被2和3 MeV质子损伤时折射率实部和虚部的变化进行了系统研究。在用扫描离子微束注入125 × 125 μ m^2区域后，用激光干涉显微镜测量注入区域光程长度的变化，同时用具有微米空间分辨率的光谱装置研究它们的光透射。在考虑了体样品中强非均匀损伤分布的模型的基础上，计算了复折射率随损伤密度的变化。
英文摘要：
An accurate control of the optical properties of single crystal diamond during microfabrication processes such as ion implantation plays a crucial role in the engineering of integrated photonic devices. In this work we present a systematic study of the variation of both real and imaginary parts of the refractive index of single crystal diamond, when damaged with 2 and 3 MeV protons at low-medium fluences (range: 10^15 - 10^17 cm^-2). After implanting in 125x125 um^2 areas with a scanning ion microbeam, the variation of optical pathlength of the implanted regions was measured with laser interferometric microscopy, while their optical transmission was studied using a spectrometric set-up with micrometric spatial resolution. On the basis of a model taking into account the strongly non-uniform damage profile in the bulk sample, the variation of the complex refractive index as a function of damage density was evaluated.
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