在掩埋界面处成形、成像和控制等离子体干涉场
Shaping, imaging and controlling plasmonic interference fields at buried interfaces
摘要：
以纳米（nm）和飞秒（fs）分辨率在掩埋界面处成膜和控制等离子体激元尚未实现，并且对于下一代等离子体激元/电子器件至关重要。在这项工作中，我们使用光来激发和形状的等离子体干涉图案在埋在纳米结构的薄膜中的金属-电介质界面。等离子体激元从光激发的纳米腔阵列中发射，其传播通过光子诱导近场电子显微镜（PINEM）拍摄。由此产生的电影直接捕捉等离子体动力学，允许量化它们的群速度约为0.3c，与我们的理论预测一致。此外，我们表明，光的偏振和纳米腔的设计可以定制形状瞬态等离子体光栅在纳米尺度。这些结果表明，动态成像与PINEM，铺平了道路的fs/nm可视化和先进的异质结构的等离子体场的控制的基础上的新型2D材料，如石墨烯，MoS $_2$，金属薄膜。
英文摘要：
Filming and controlling plasmons at buried interfaces with nanometer (nm) and femtosecond (fs) resolution has yet to be achieved and is critical for next generation plasmonic/electronic devices. In this work, we use light to excite and shape a plasmonic interference pattern at a buried metal-dielectric interface in a nanostructured thin film. Plasmons are launched from a photoexcited array of nanocavities and their propagation is filmed via photon-induced near-field electron microscopy (PINEM). The resulting movie directly captures the plasmon dynamics, allowing quantification of their group velocity at approximately 0.3c, consistent with our theoretical predictions. Furthermore, we show that the light polarization and nanocavity design can be tailored to shape transient plasmonic gratings at the nanoscale. These results, demonstrating dynamical imaging with PINEM, pave the way for the fs/nm visualization and control of plasmonic fields in advanced heterostructures based on novel 2D materials such as graphene, MoS$_2$, and ultrathin metal films.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
