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arXiv 1509.03087cond-mat.mes-hall
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六方氮化硼在铁磁纳米结构抗氧化中的作用

Role of hexagonal boron nitride in protecting ferromagnetic nanostructures from oxidation

Simon Zihlmann, Péter Makk, C. A. F. Vaz, Christian Schönenberger

摘要:

铁磁接触广泛用于将自旋极化电流注入非磁性材料,例如半导体或二维材料,如石墨烯。在这些系统中,铁磁材料的氧化对器件性能造成固有限制。在这里,我们调查的作用,异位转移化学气相沉积六方氮化硼(hBN)作为纳米结构的钴和坡莫合金电极的氧化屏障。利用X射线光电子显微镜的高灵敏度和横向分辨率,研究了铁磁体的化学状态。我们已经比较了在由hBN覆盖的铁磁纳米结构上形成的氧化物厚度与未覆盖的参考结构。我们的研究结果表明,hBN降低了铁磁纳米结构的氧化速率,这表明它可以用作未来自旋电子器件中的超薄保护层。

英文摘要:

Ferromagnetic contacts are widely used to inject spin polarized currents into non-magnetic materials such as semiconductors or 2-dimensional materials like graphene. In these systems, oxidation of the ferromagnetic materials poses an intrinsic limitation on device performance. Here we investigate the role of ex-situ transferred chemical vapour deposited hexagonal boron nitride (hBN) as an oxidation barrier for nanostructured cobalt and permalloy electrodes. The chemical state of the ferromagnets was investigated using X-ray photoemission electron microscopy owing to its high sensitivity and lateral resolution. We have compared the oxide thickness formed on ferromagnetic nanostructures covered by hBN to uncovered reference structures. Our results show that hBN reduces the oxidation rate of ferromagnetic nanostructures suggesting that it could be used as an ultra-thin protection layer in future spintronic devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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