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arXiv 1507.04066cond-mat.mes-hall
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δ掺杂Si:P线的电子输运

Electronic transport in Si:P delta-doped wires

J. S. Smith, D. W. Drumm, A. Budi, J. A. Vaitkus, J. H. Cole, S. P. Russo

摘要:

尽管Si:P δ掺杂线对于现代纳米电子学的重要性,但是目前在这些器件中没有电子输运的计算模型。在本文中,我们提出了一个非平衡格林函数模型的电子输运在δ掺杂的导线,这是一个紧束缚的哈密顿矩阵内的单带有效质量近似。我们使用这个输运模型计算了一些δ掺杂的线的电流-电压特性,取得了很好的协议与实验。为了激发我们的输运模型,我们进行了密度泛函计算的各种δ掺杂的电线,每个具有不同的施主配置。这些计算还使我们能够准确地定义δ掺杂导线的电子范围,我们发现至少为4.6 nm。

英文摘要:

Despite the importance of Si:P delta-doped wires for modern nanoelectronics, there are currently no computational models of electron transport in these devices. In this paper we present a nonequilibrium Green's function model for electronic transport in a delta-doped wire, which is described by a tight-binding Hamiltonian matrix within a single-band effective-mass approximation. We use this transport model to calculate the current-voltage characteristics of a number of delta-doped wires, achieving good agreement with experiment. To motivate our transport model we have performed density-functional calculations for a variety of delta-doped wires, each with different donor configurations. These calculations also allow us to accurately define the electronic extent of a delta-doped wire, which we find to be at least 4.6 nm.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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