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arXiv 1506.01673cond-mat.mes-hallphysics.chem-ph
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CO $_2$和CH $_4$分子在表面和薄膜附近范德华能和Casimir-Polder能的各向异性贡献

Anisotropic contribution to the van der Waals and the Casimir-Polder energies for CO$_2$ and CH$_4$ molecules near surfaces and thin films

Priyadarshini Thiyam, Prachi Parashar, K. V. Shajesh, Clas Persson, Martin Schaden, Iver Brevik, Drew F. Parsons, Kimball A. Milton, Oleksandr I. Malyi, Mathias Boström

摘要:

为了理解为什么二氧化碳(CO $_2$)和甲烷(CH $_4$)分子与表面的相互作用不同,我们调查的Casimir-Polder能量的线性极化CO $_2$分子和各向同性极化CH $_4$分子前面的原子级薄的金膜和无定形二氧化硅板。我们定量分析了分子极化率的各向异性如何影响分子结合能的范德华贡献。

英文摘要:

In order to understand why carbon dioxide (CO$_2$) and methane (CH$_4$) molecules interact differently with surfaces, we investigate the Casimir-Polder energy of a linearly polarizable CO$_2$ molecule and an isotropically polarizable CH$_4$ molecule in front of an atomically thin gold film and an amorphous silica slab. We quantitatively analyze how the anisotropy in the polarizability of the molecule influences the van der Waals contribution to the binding energy of the molecule.

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