应用因子分析数据评价改进多层薄膜系统AES深度剖面的实例
Examples for the improvements in AES Depth Profiling of Multilayer Thin Film Systems by Application of Factor Analysis Data Evaluation
摘要：
因子分析已被证明是一个强有力的工具，充分利用所测得的AES深度剖析谱的峰形和峰位的化学信息。由于它能够提取独立的化学成分的数量，它们的光谱和它们的深度分布，它的信息量超过了通常的AES深度剖面数据的峰到峰高评估之一。使用具有图形交互式用户界面的现代软件，分析师可以在物理直观的水平上使用因子分析，尽管它基于所有的矩阵代数数学。通过对两个薄膜系统的分析，说明了因子分析法对薄膜AES深度分布的改进。第一种是Pt/Ti金属化作为铁电薄膜的底电极，第二种是多层系统，其中Ti硅化物形成的埋Ti/Si双层已被诱导。这两个例子表明，AES深度分布数据的因子分析评价能够获得化学计量信息，并揭示界面层相，这是很难从传统的峰到峰高数据评价获得的信息。
英文摘要：
Factor Analysis has proved to be a powerful tool for the full exploitation of the chemical information included in the peak shapes and peak positions of spectra measured by AES depth profiling. Due to its ability to extract the number of independent chemical components, their spectra and their depth distributions, its information content exceeds the one of the usual peak-to-peak height evaluation of AES depth profile data. Using modern software with a graphically interactive user interface the analyst is put into a position, where he can work with Factor Analysis on a physically intuitive level despite of all the matrix algebra mathematics which it is based upon. The progress brought about by Factor Analysis to AES depth profiles of thin films is demonstrated by the analysis of two thin film systems. The first one is a Pt/Ti metallisation used as bottom electrode for ferroelectric thin films, the second one is multilayer system where a Ti silicide formation of burried Ti/Si bilayers has been induced. Both examples show that Factor Analysis evaluation of AES depth profile data is capable to give access to stoichiometry information and to reveal interfacial layer phases, information which is hardly obtained from the conventional peak-to-peak height data evaluation.
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