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arXiv 1502.03606cond-mat.mes-hall
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二维层状二硫化钼构成的极薄垂直pn结

Ultimate Thin Vertical p-n Junction Composed of 2D Layered Molybdenum Disulfide

Hua-Min Li, Daeyeong Lee, Deshun Qu, Xiaochi Liu, Jungjin Ryu, Alan Seabaugh, Won Jong Yoo

摘要:

半导体2D晶体由于其成为用于有效静电调制的超薄体的巨大潜力而目前受到极大关注,这使得能够克服硅技术的限制。在这里,我们报告,作为一个关键的构建块的二维半导体器件,垂直pn结的制造在掺杂二硫化钼通过引入AuCl 3和苄基紫精掺杂。与通常的单极MoS 2不同,MoS 2 pn结表现出(i)双极载流子输运,(ii)通过调制厚于8 nm的膜中的势垒的电流整流,和(iii)通过隧穿的反向电流整流,薄于8 nm的膜。实验测得MoS_2中垂直p-n均匀结的极限厚度为3 nm,化学掺杂深度为1.5nm。MoS_2 pn结在柔性、透明、高效率的电子和光电子应用中具有巨大的潜力。

英文摘要:

Semiconducting 2D crystals are currently receiving significant attention due to their great potential to be an ultra-thin body for efficient electrostatic modulation which enables to overcome the limitations of silicon technology. Here we report that, as a key building block for 2D semiconductor devices, vertical p-n junctions are fabricated in ultrathin MoS2 by introducing AuCl3 and benzyl viologen dopants. Unlike usual unipolar MoS2, the MoS2 p-n junctions show (i) ambipolar carrier transport, (ii) current rectification via modulation of potential barrier in films thicker than 8 nm, and (iii) reversed current rectification via tunneling in films thinner than 8 nm. The ultimate thinness of the vertical p-n homogeneous junctions in MoS2 is experimentally found to be 3 nm, and the chemical doping depth is found to be 1.5 nm. The ultrathin MoS2 p-n junctions present a significant potential of the 2D crystals for flexible, transparent, high-efficiency electronic and optoelectronic applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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