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arXiv 1401.4553cond-mat.mtrl-sci
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线缺陷对单层MoS $_{2}$电输运性能的影响

Effect of line defects on the electrical transport properties of monolayer MoS$_{2}$ sheet

Amretashis Sengupta, Dipankar Saha, Thomas A. Niehaus, Santanu Mahapatra

摘要:

我们提出了一个计算研究的影响线缺陷的单层二硫化钼的电子性质。四种不同类型的线缺陷与Mo和S作为桥接原子,与最近的理论和实验观察被认为是在这里。我们采用密度泛函紧束缚(DFTB)方法与Slater-Koster型DFTB-CP 2K基组的完美和各种缺陷的二硫化钼片的材料性能进行评估。透射光谱计算与DFTB-非平衡格林函数(NEGF)的形式主义。我们还进行了详细的分析,在一个小的偏置下的载流子传输路径和调查的相移在有缺陷的二硫化钼片的传输本征态。我们的模拟结果表明,在存在线缺陷的二硫化钼片的载流子电导的2-4倍减少相比,为完美的片。

英文摘要:

We present a computational study on the impact of line defects on the electronic properties of monolayer MoS2. Four different kinds of line defects with Mo and S as the bridging atoms, consistent with recent theoretical and experimental observations are considered herein. We employ the density functional tight-binding (DFTB) method with a Slater-Koster type DFTB-CP2K basis set for evaluating the material properties of perfect and the various defective MoS2 sheets. The transmission spectra is computed with a DFTB-Non-Equilibrium Greens Function (NEGF) formalism. We also perform a detailed analysis of the carrier transmission pathways under a small bias and investigate the phase shifts in the transmission eigenstates of the defective MoS2 sheets. Our simulations show a 2-4 folds decrease in carrier conductance of MoS2 sheets in the presence of line defects as compared to that for the perfect sheet.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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