磁控溅射Cu/Co多层膜中表面活性剂增强的反铁磁耦合：中子反射率研究
Surfactant enhanced antiferromagnetic coupling in magnetron sputtered Cu/Co multilayers: A neutron reflectivity study
摘要：
在这项工作中，我们研究了用直流磁控溅射技术与Ag表面活性剂制备的Cu/Co多层膜。结果发现，Ag平衡了Cu和Co的表面自由能的差异，这导致去除了Cu-on-Co和Co-on-Cu界面的界面粗糙度的不对称性。由于界面变得对称，我们观察到反铁磁耦合和磁阻显着增强。此外，通过比较不同沉积方法制备的Cu/Co多层膜，得到了自旋相关散射与界面粗糙度的相关性。结果发现，随着界面粗糙度的增加，自旋相关散射降低。
英文摘要：
In this work we studied Cu/Co multilayers prepared using dc-magnetron sputtering technique with Ag surfactant. It was found that Ag balances the difference in the surface free energy of Cu and Co and this results in removing the asymmetry in the interface roughness of Cu-on-Co and Co-on-Cu interfaces. As the interfaces become symmetric, we observe a significant enhancement in antiferromagnetic coupling and magneto resistance. Further, a correlation of spin-dependent scattering with the interface roughness is brought by comparing Cu/Co multilayer prepared using different deposition methods. It was found that as interface roughness increases spin-dependent scattering decreases.
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